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Abstract
Dielectric thin films are core materials in high-end manufacturing fields such as optics and semiconductors, and the precise measurement of their thickness and optical constants directly affects product performance and yield. With the measurement technology of Filmetrics white light interference film thickness gauge, Younikon Technology provides customers with a fast and accurate complete solution for dielectric thin films, empowering research and quality control.
Principle of White Light Interference Technology:
When incident light passes through interfaces of different substances, some of the light will be reflected. Due to the fluctuation of light, the reflected light from multiple interfaces interferes with each other, resulting in oscillations in the multi wavelength spectra of the reflected light. From the oscillation frequency of the spectrum, the distance between different interfaces can be determined to obtain the thickness of the material (more oscillations represent greater thickness), as well as other material properties such as refractive index and roughness.
1、 Silicon dioxide film: the benchmark for industry measurement
Silicon dioxide is often regarded as an ideal measurement standard substance due to its almost no absorption (k ≈ 0) over a wide spectral range and stable stoichiometric ratio (silicon to oxygen ratio close to 1:2). The optical response of thermally grown silica is highly standardized and widely used for calibration of thickness and refractive index measuring instruments.
Nikon Solution:
The white light interferometry measurement system of Filmetrics film thickness gauge can accurately measure3nm to 1mmThe thickness of the silicon dioxide film within the range establishes a reliable quality benchmark for you.
2、 Silicon Nitride Thin Films: Addressing the Challenges of Complex Components
Unlike silicon dioxide, the measurement challenges of silicon nitride thin films significantly increase, mainly due to:
Non stoichiometric ratioThe silicon to nitrogen ratio of the deposited thin film often deviates from the ideal value of 3:4.
Oxygen impurity dopingThe infiltration of oxygen during the process will form silicon nitride oxide, which complicates the optical properties of the thin film.
Therefore, when accurately measuring its thickness, it is necessary to simultaneously analyze its refractive index and extinction coefficient.
Technological breakthrough:
Faced with the challenges in this industry,Using Filmetrics' Silicon Nitride Diffusion Model， F20-UVX can achieve "one click" measurement within seconds, comprehensively analyzing the thickness and optical constants of silicon nitride films. Even for complex component films rich in silicon, poor in silicon, or containing oxygen, it can provide accurate characterization.
3、 Typical application case: Comprehensive characterization of silicon nitride thin films
In the semiconductor field, silicon nitride is widely used as a dielectric layer, passivation layer, and mask material.
Case background:
Customers need to accurately measure the thickness, refractive index, and extinction coefficient of silicon nitride thin films on silicon substrates to monitor their process stability.
Nikon's Solution and Value:
By using the Filmetrics F20-UVX film thickness gauge, we not only quickly obtainedThickness, refractive index, and extinction coefficient of thin filmsFurthermore, advanced data analysis models have revealed the intrinsic correlation between the optical properties of thin films and their molecular equivalents. This enables customers to:
Accurate monitoring of processReal time feedback on the stability and consistency of sedimentation processes.
Optimize film performanceAdjust the process parameters based on the measurement results to obtain the desired performance of the film.
Improve product yieldControl material properties from the source to reduce the risk of failure in subsequent stages.
Using equipment:
Use software parameter configuration:
Measurement results:
Younikon Technology is always committed to empowering your research and quality control with precise data. We believe that true value comes from solving practical problems for our customers.
If your project is facing the challenge of measuring dielectric thin films, please feel free to contact us immediately to schedule a free exclusive sample testing service.Just send out your samples, and our application engineering team will present you with a clear, accurate, and insightful data report, and work with you to interpret the results and explore solutions.
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