Amorphous polycrystalline silicon
Silicon exists in two forms: amorphous and crystalline, with partially crystalline silicon between the two levels. Partially crystalline silicon is also known as polycrystalline silicon.
The optical constants (n and k) of amorphous silicon and polycrystalline silicon require precise thickness measurements for different deposition conditions. When measuring thickness, roughness and possible weathering of silicon film crystallization are also considered. The complex measurement program provided by Filmetrics equipment simultaneously measures and outputs each required silicon thin film parameter, and "one click" the results.
Measurement Example
Polycrystalline silicon is widely used in silicon-based electronic devices. The efficiency of these devices depends on the optical and structural properties of the thin film. As the deposition and annealing conditions change, these characteristics also change, so accurate measurement of these parameters is crucial. Monitoring the silicon substrate and polycrystalline silicon, adding a silicon dioxide layer to increase optical contrast, the film thickness and optical properties can be measured. F20 can easily measure the thickness and optical constants of polycrystalline silicon thin films, as well as the thickness of silicon dioxide interlayers. The Bruggeman optical model is used to measure the optical properties of polycrystalline silicon thin films.
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