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KLA D-600 Compact Stylus Profiler Product Brochure

Brief Description ：: Download official brochure for KLA Alpha-Step D-600 benchtop stylus profiler adopting optical lever sensor, supporting 1nm–1200μm step height, adjustable low contact force 0.03–15mg. It delivers 2D/3D roughness, wafer bow and thin film stress measurement with motorized 200mm XY stage, 5MP high-res vision and automatic mapping function. This brochure covers hardware specs, diamond stylus options, built-in analysis software and application cases for university labs, MEMS, semiconductors, LED and photovoltaic R&D.

File version ：: V1.0.1

File type ：: PDF

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The KLA Alpha-Step D-600 is a compact, cost-effective benchtop stylus profiling platform built on decades of Alpha-Step metrology heritage, tailored for academic labs, material research and small-batch process quality control. Equipped with proprietary dual-channel optical lever sensor technology, it achieves ultra-high vertical resolution while covering an extra-wide vertical measurement range from 1 nanometer up to 1200 μm, perfectly balancing precision and versatility for both ultra-thin deposited films and deep etched microstructuresKLA.

The system features a fully motorized XY stage compatible with substrates up to 200 mm, supporting programmable automatic multi-point mapping and seamless scan stitching to generate complete 2D line profiles and 3D surface topography maps. Adjustable contact force ranging from 0.03 mg to 15 mg eliminates scratch damage on delicate soft materials including photoresist, PDMS and polymer coatings, with interchangeable diamond stylus tips of various radii available to match micro and macro feature inspection demands. A built-in 5MP high-resolution color optical camera delivers clear real-time sample observation, fast pattern recognition and precise target alignment before scanning.

Integrated dedicated profiling software supports automated batch measurement sequencing, surface roughness/waviness analysis, wafer bow calculation and thin film stress computation via Stoney’s equation. This official brochure details complete mechanical and optical parameters, optional vacuum sample chucks, standardized calibration workflows and abundant industry application solutions covering semiconductor lithography etching, MEMS microdevices, LED sapphire substrates, solar cell passivation layers, optical coatings and biomedical thin films. One-click PDF download is available for equipment evaluation, process parameter optimization and laboratory test scheme design.