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KLA Tencor P-17 Benchtop Stylus Profiler Product Brochure

Brief Description ：: Download official product brochure for KLA Tencor P-17 eighth-gen benchtop stylus profiler equipped with UltraLite low-force sensor, supporting 200mm full-length seamless scanning. It measures step height, surface roughness, wafer bow and thin film stress with sub-angstrom vertical resolution, compatible with silicon, SiC, sapphire, GaAs wafers. This brochure covers hardware specs, interchangeable stylus tips, intuitive measurement software and application solutions for semiconductor R&D, power devices, LED substrates and data storage manufacturing.

File version ：: V1.0.1

File type ：: PDF

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The KLA Tencor P-17 is the eighth-generation benchtop stylus profiling platform built on over 45 years of KLA surface metrology technology, designed for high-precision 2D & 3D topography characterization across academic labs, material R&D and small-volume production lines. Equipped with the proprietary UltraLite® inductive displacement sensor, it delivers adjustable constant contact force ranging from 0.03 mg to 50 mg, eliminating scratch damage on delicate soft thin films while maintaining sub-angstrom vertical resolution and industry-leading measurement repeatability below 0.4 nm.

The standard 200 mm programmable scanning stage enables full-wafer continuous measurement without stitching, covering vertical topography from several nanometers up to 1 mm to quantify step height, micro roughness, surface waviness, wafer bow and deposited film stress. Dual top & side view optics paired with a 5MP high-resolution color camera simplify target alignment, pattern recognition and real-time stylus observation during scanning. An expandable open-frame P-17 OF variant is also available to accommodate larger substrates up to 300 mm.

The bundled intuitive operation software supports one-click recipe creation, batch automated sequencing, multi-dimensional data fitting and comprehensive filtering algorithms for surface data analysis. This official brochure details complete mechanical parameters, optional stylus tip selections, automatic calibration workflows and abundant industrial application cases including lithography etching profiles, CMP planarization inspection, power device SiC substrates, LED sapphire wafers, magnetic storage media and optical coating films, with one-click PDF download available for process optimization and laboratory equipment evaluation.