KLA R50 Series Product Brochure

Brief Description ：: Download official PDF manual for KLA Filmetrics R50 benchtop system with optional 4PP & Eddy Current modules, 100/200mm stage versions, 100mm Z travel, 1mΩ/sq~200MΩ/sq measuring range. Covers specs, probe selection & applications for ion implant, metal thin film, flexible electronics labs.

File version ：: V1.0.1

File type ：: PDF

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The KLA Filmetrics R50 is a versatile benchtop automated sheet resistance mapping system built on over 45 years of KLA resistivity measurement technology. Two configurable modules are available: contact four-point probe (R50-4PP) and non-contact eddy current (R50-EC), with 100mm small-sample and 200mm wafer stage versions for lab R&D and small-batch production QC.

Key hardware highlights: 100mm extended Z-axis travel with coarse & fine dual height adjustment, compatible with thick substrates and irregular coated samples. High-precision motorized X-Y stage supports rectangular, linear, polar and custom sampling patterns to auto-generate 2D & 3D sheet resistance uniformity contour maps. The 4PP module delivers 1mΩ/sq ~ 200MΩ/sq range for ion implant, epitaxial and ultra-thin metal layers; non-contact EC mode avoids surface scratches, ideal for photoresist-coated wafers, flexible conductive films and ITO glass with 1mΩ/sq ~ 50Ω/sq measurement rangeFilmetrics.

Equipped with user-friendly RsMapper mapping software, all test data traceable to NIST resistance standards. Without light-tight chamber design, the R50 features superior cost performance for multi-station laboratory deployment.

This official PDF manual includes full machine dimensions, complete probe selection guide, eddy current height compensation algorithm, one-click auto-measure workflow and standard calibration procedures. Application cases cover compound semiconductor wafers, photovoltaic conductive coatings, FPD ITO layers, PCB circuits, flexible wearable electronics and optical coatings, with one-click PDF download available.