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Exciting Q&A
Brilliant Q& A
Introduction
Introduction
In the just concluded online seminar, we gained much more than expected enthusiastic interaction. The precise questioning and in-depth communication during the conference not only reflected the high attention of industry colleagues to thin film measurement technology, but also truly reflected the practical challenges faced by everyone in daily research and quality control.
To consolidate this valuable knowledge, we have compiled the most representative and frequently occurring core questions from this seminar, and attached authoritative answers from KLA and Nikon technology experts. What you are concerned about is exactly what we have described in detail. I hope this carefully compiled Q&A record can become a regular "technical solution" at your fingertips, continuously empowering your precise measurement work.
question
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answer, solution, explanation, resolution
Answers
Why is there a spectral reflectometer but no spectroscopic ellipsometer for measuring film thickness? Can four probes be used to measure film thickness if the top layer is made of two different metals?
At present, the KLA ellipsometer solution is still provided as an automation product for Fab customers, and desktop ellipsometers have not yet been added to the KLA instrument department.
When measuring film thickness with a four probe square resistance meter, if it is a two-layer metal film, the result obtained is a weighted average of the conductivity of the two films due to their mutual conductivity. If it is necessary to measure a single film layer on the surface, it is still recommended to add an insulation layer below the film layer to avoid mixing up
What are the core advantages of a light reflection film thickness gauge compared to an ellipsometer or other film thickness measurement techniques?
Are there any requirements for the sample before measuring with a film thickness gauge? For example, if the surface is dirty or the sample does not have a certain degree of roughness. Does it have a significant impact on the results?
At present, I know that ellipsoidal film thickness measurement equipment is currently applied in the fab end. May I ask if the optical reflection film thickness measurement equipment is applied in the fab end? Thank you!
May I ask how many nanometers can be measured by the thinnest light reflection film thickness measuring equipment? Can multi-layer transparent films be measured? How many layers can be measured at most?
Just mentioned the material library, we often test some non-standard or new materials. What if there are no parameters in the database? Does the instrument software support us to build and fit models ourselves? Is the process more complicated?
Are these pictures displayed actual measurement cases? Can we provide sample testing services?
Yes, they are all actual cases of our company.
Of course, welcome to our laboratory for joint learning; Alternatively, you can send us the samples and we can provide measurement results using a prototype.
We have a special requirement to measure the film thickness on a curved surface. Does our equipment have this special measurement mode or accessory?
The measurement of surface film thickness on curved surfaces is a challenging application. It depends on the curvature of the curved surface? For example, in the automotive lighting industry, the hardening layer is usually plated on different surfaces of the car lights, and the surface of the car lights also has a certain curvature. In this case, using a contact probe can effectively solve the problem of signal collection. As long as sufficient effective signals can be collected, specific requirements for measuring curved surfaces can be met. At the same time, the micro area measurement mode of F40 can also solve the application problem of arc facial mask layer to a certain extent.
We often need to test dozens of samples from the same batch to evaluate uniformity. Does your instrument have an automatic sample stage? Is it complicated to set up an automatic measurement process?
If it is necessary to measure many samples from the same batch to evaluate the uniformity of the film layer, then the F50 series film thickness gauge would be a very good choice. The measurement results of a single sample will directly display the display diagram of the thickness of the surface facial mask layer, the maximum, minimum, TTV, U% and other data.
Establishing a formula for automatic measurement is not a very complex process. Generally speaking, our engineers will directly provide a comprehensive measurement formula during the application support process. Subsequent measurements only require selecting the corresponding formula, clicking on 'start measurement', and obtaining measurement results including uniformity.
Can Si epitaxial polycrystalline silicon be measured?
Is it just Poly Si? Of course, and it's a very common application. In the semiconductor front-end silicon wafer manufacturing process, Poly Si measurement is a widely required process node.
Is it possible to measure silicon wafers because infrared light is used?
Yes. Silicon wafers are opaque to visible light (400-850nm), but transparent to infrared light (850-1700nm), which means that infrared light can penetrate the surface silicon film layer.
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