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Gather in Shanghai! Younikon/Yiying Technology sponsors the 3rd photomask and photoresist technology forum, inviting a special report to deeply interpret the application of film thickness measurement

2026-06-27 16:45:51 优尼康

The 3rd Photomask and Photophotoresist Technology ForumThe forum will open on April 24th at the Ruijing Hall on the 3rd floor of Zhangjiang Weijing International Hotel in Pudong, Shanghai. The main focus of this forum will be on High NA EUV lithography, nanoimprint lithography, electron beam lithography, directed self-assembly (DSA), and X-ray lithography. These technologies aim to improve resolution, reduce costs, and increase productivity.

As a benchmark in the field of precision measurement for 15 years, Unicon/Yiying Technology has been awarded the sponsorship of this forum. Younikon has served over 2000 customers in total, and we look forward to exchanging ideas with you at the venue to discuss the innovative future of semiconductor measurement technology.

Specially invite Lu Wei, Senior Application Technology Manager of Younikon/Yiying, to give a keynote speech. He will delve into the core measurement pain points in the process of photomask and photoresist, and share how measurement technology can accurately control the key points of the process.
Report topic:
Key to Controlling Films: Application of Nikon Thin Film Measurement Technology in Photomask and Photophotoresist Processes

Scan the code and add WeChat,Paid participation

Precision thin film measurement expert

Younikon Technology Co., Ltd. | Yiying Technology (Shanghai) Co., Ltd

Meeting time:

April 24, 2026

Exhibition location:

Ruijing Hall, 3rd Floor, Zhangjiang Weijing International Hotel, Pudong, Shanghai

On site invited report

Speaker's Introduction

Lu Wei | Application Technology Manager of Younikon/Yiying Technology

With years of experience in the semiconductor and thin film measurement industry, we specialize in compound material measurement applications and optimizing the entire semiconductor process. Has strong practical skills in handling unexpected issues on the device side and innovating measurement technology. I have participated in multiple domestic seminars on thin film testing technology, exchanged ideas with peers, expanded my horizons, and introduced new concepts and technical resources to the company. Ensure the smooth connection of the entire process from application development to customer use of testing equipment, and maximize the value of semiconductor testing equipment through technological empowerment, contributing to the overall competitiveness of the company.

Title of speech report

The key to controlling the film: the application of Nikon thin film measurement technology in photomask and photoresist processes

Report time:

April 24th 15:15

Meeting agenda

Exhibition equipment

Filmetrics film thickness gauge


Filmetrics F20 single point portable film thickness gauge
Whether you want to know film thickness, optical constants, or material reflectivity and transmittance, F20 can meet your needs. It only takes a few minutes to complete the installation, and the device can obtain measurement results within seconds by connecting to a computer via USB. Based on the characteristics of a modular design, F20 is suitable for various applications.
Related applications:Photoresist, process film, dielectric materialHard coatingParylene,Anti reflection layerMedical equipment OLED, Glass thickness, ITO, and other TCO.

Filmetrics F50 Automatic Mapping Film Thickness Gauge
F50 can easily achieve maximum straightThickness distribution map of sample film with a diameter of 450 millimeters. Using an r - θ polar coordinate moving platform,Can quickly locate the required test points and obtain real-time test thickness, approximatelyTest two points per second.
Related applications:Semiconductor manufacturing (photoresist, oxide/nitride/SOI, wafer backside grinding); LCD liquid crystal display (polyimide, ITO transparent conductive film); Optical coating (hard coating, anti reflection layer); MEMS microelectromechanical systems (photoresist, silicon-based film layers).