The protagonist of our class today, It is a world-renowned instrument brand, It has dominated the fields of thin film thickness and sheet resistance measurement for many years, It was founded in one thousand nine hundred and ninety-five and joined the KLA family in two thousand and nineteen, becoming KLA InstrumentsTMAs part of the business, It isFilmetrics®， What makes it occupy a place in this niche field, the answer lies in its development history. one thousand nine hundred and ninety-five Filmetrics®F20 was born - one of the few compact and easy-to-use thin film measuring instruments in the world. F20 is an instrument that uses a miniature fiber optic spectrometer to measure the thickness of thin films Using the characteristic features generated by coherent interference, analyze the white light reflected from the surface coated with a thin film to measure the thickness of the film. F20 is easy to use and has a compact structure. With the rapidly growing computing power of desktop personal computers and modern graphical user interface software, users who were previously unable to accurately measure thin films using other applications can now switch to using it. one thousand nine hundred and ninety-six We have launched Filmetrics F30, a reflectivity based deposition rate monitoring instrument designed specifically for monitoring the epitaxial growth of semiconductor crystals. one thousand nine hundred and ninety-seven Filmetrics F30 wins the R&D Top 100 Enterprise Award Filmetrics F30 performs in-situ and real-time deposition rate monitoring during the MOCVD or MBE growth process of semiconductor epitaxial layers. F30 is developed by Sandia National LaboratoryVirtual Interface Technology1. Continuously measure the light reflected from the sample surface to monitor the crystal growth rate. Due to the independence of virtual interface technology from the underlying structure, alloys of different compositions can be sequentially deposited on a single wafer to quickly calibrate the growth rate and composition of various materials. one thousand nine hundred and ninety-eight Photonics Spectra presented the Circle of Excellence award to Filmetrics F20, naming it one of the top 25 technologically innovative optoelectronic products worldwide. The Filmetrics F40 small spot measuring instrument can be connected to a standard microscope and can measure film thickness with spot sizes as small as 10 µ m Filmetrics F20 and F30 can currently be equipped with ultraviolet spectrometers, covering wavelengths from 215nm to 670nm, reducing the minimum measurable film thickness from 10nm to 3nm. The R-Theta stage on the Filmetrics F50 instrument can carry wafers with a diameter of 200 millimeters, allowing the system to measure and display film thickness at user-defined locations. By using chemical mechanical polishing（CMP）During the continuous monitoring of reflectance spectra, the Filmetrics F76 in-situ CMP endpoint detection system can accurately determine process endpoints. two thousand and one UseHyperspectral imaging system， The Filmetrics STApper full wafer imaging instrument can measure the thickness distribution of thin films on a 200mm diameter wafer in less than 5 seconds using a 50 micron spot size. The R&D magazine awarded Filmetrics STApper the "R&D Top 100" award, listing it as one of the 100 most important new products of the year. two thousand and two The 1000th Filmetrics thin film measuring instrument has been shipped. Filmetrics sells more thin film measuring instruments than any other manufacturer. The widespread acceptance in the market is attributed to the ease of use and economy of the instrument, as well as the efficient and high-quality service support of the Filmetrics application team. Instrument software (FILMeasure for manual sample stage) ® And FILApper for automatic sample stage ™) Added a large number of new features and performance improvements. two thousand and three An improved Vis NIR spectrometer has become the standard configuration spectrometer for all Filmetrics thin film measurement instruments, covering the wavelength range of 400nm to 1000nm and capable of measuring thin films with thicknesses ranging from 15nm to 50 μ m. At present, all instruments can be equipped with NIR spectrometers, covering the wavelength range of 950nm to 1700nm, and can measure film thickness from 100nm to 100 µ m. Filmetrics has launched the F20-EXR instrument, which includes visible light and NIR spectrometers capable of measuring film thickness from 15nm to 100 µ m. two thousand and five Filmetrics F80- High Speed Graphic Wafer Thin Film Thickness Measurement System Filmetrics F80 is a high-speed, small spot, hyperspectral imaging thin film thickness measurement instrument. It can measure graphical wafers with a diameter of up to 200 millimeters. The hyperspectral imaging system adopts revolutionary pattern recognition technology, which can distinguish regions in the field of view based on the stacking, composition, and thickness of thin films. two thousand and six Using a hyperspectral imaging system, the Filmetrics F42 micro speckle measurement instrument can generate thin film thickness distribution maps with pixel sizes as small as 3 µ m. two thousand and seven The Filmetrics thin film measuring instrument can be equipped with an improved UV Vis spectrometer, covering wavelengths of 200nm-1100nm, making it easy to measure film thickness from 1nm to 40 µ m. Filmetrics F20-CP has added a new Filmetrics technology calledAutoBaseline ™When the probe moves into contact with the sample, it continuously compensates for changes in the optical system, greatly improving accuracy and stability. two thousand and eight Filmetrics F80-c is a high-throughput, fully automated graphical wafer measurement instrument with pattern recognition capability, capable of identifying wafers up to 300 millimeters in diameter. two thousand and nine Filmetrics has launched the F60-t desktop and F60-c fully automated instruments for measuring film thickness on unpatterned wafers with a diameter of up to 300 millimeters. two thousand and ten The reflectivity and transmittance measurement function of the vertically incident light source has been added to Filmetrics F10-VC, which can also be used to accurately measure the absorption rate of thin films. two thousand and eleven The reflectivity/transmittance/angular reflectivity function of Filmetrics F10-RTA is achieved by adding an additional optical subsystem to F10-VC to measure the reflectivity at a certain angle. These measurement results can be combined with vertical incident reflectance and transmittance data to measure the n and k of the film without the need for n and k models. The Filmetrics F50-XY-510 automatic thin film thickness gauge is equipped with a unique X-Y translation system, which can measure samples with a maximum size of 510mm x 510mm. The new Filmetrics F70 adopts color coded optical design, which can measure films from 50 µ m to 15mm. two thousand and twelve The new Filmetrics aRTie instrument simultaneously measures reflectance and transmittance spectra, including a light source with a lifespan of 40000 hours and powered through a USB interface cable. Filmetrics F10-ARc - a compact portable instrument used to measure the thickness of plastic lens coatings. Filmetrics launches automatic wavelength calibration technology, which uses integrated gas discharge lamps to significantly improve accuracy and stability. two thousand and thirteen Using the R-Theta automatic sample stage, the Filmetrics F54 microscope spot measuring instrument provides automated sample film thickness distribution maps, measuring spot sizes as small as 2.5 µ m The Filmetrics SS-XY-38 automatic X-Y-Z sample stage has a 38mm X-Y stroke and added autofocus function, which can be used in conjunction with new or existing instruments, such as the Filmetrics F20. two thousand and fourteen The Filmetrics F57 CTM combines Filmetrics color coding measurement technology with the R-Theta sample stage to measure samples with diameters up to 300 millimeters and film thicknesses ranging from 50 µ m to 15 mm. The Filmetrics LS-DT2 UV Vis NIR fiber optic light source provides higher reliability, USB based digital function control, and lamp life measurement, designed to be paired with Filmetrics instruments including UV spectrometers. two thousand and fifteen The Filmetrics F64-c fully automated instrument utilizes an automatic turntable, automatic wafer transfer, optional pre calibrator, and precision optical calibration mechanism to measure graphical wafer film thickness using spot sizes as small as 1 µ m. Filmetrics sX series instruments, such as F3-sX, can measure film thicknesses up to 3mm and silicon wafers up to 1.3mm thick. The Filmetrics XY10 electric stage can be mounted on most Filmetrics instruments and can perform film thickness or refractive index imaging at a speed of 0.2 seconds per point. XY10 can be optionally equipped with electric autofocus. two thousand and nineteen Filmetrics joins KLA. Filmetrics joined KLA Instruments on March 6, 2019 and became a member of KLA Corporation. The Filmetrics series of thin film measuring instruments extends KLA's desktop measurement capability to measure film thickness, n, and k. The Filmetrics Profilm3D ® The optical profilometer has expanded the product line of KLA for measuring surface morphology, providing new options for applications where KLA's existing instruments are not suitable.
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