In the fields of advanced semiconductor packaging, MEMS microelectromechanical systems, and new material research and development, the nanoscale characterization ability of surface morphology directly affects process yield and the credibility of scientific research results. As the core equipment for non-contact 3D shape measurement, the precision profilometer's vertical resolution, repeatability, and measurement efficiency have become the key to whether the laboratory can achieve accurate evaluation of steps, roughness, and texture below the micrometer level. If your laboratory still relies on a stylus profilometer or optical microscope for qualitative judgment, then a high-precisionPrecision profilometerThe introduction may completely change the quality of data. Unicon Technology Co., Ltd. has been deeply involved in the field of precision thin film measurement for many years. Its KLA Profilm3D white light interference profilometer is a professional solution designed to meet the above needs.
The current mainstream precision profilometer adopts white light interferometry technology. Taking the KLA Profilm3D provided by Nikon Technology as an example, the device divides the light beam into reference light and measurement light through a beam splitter prism, and the two reflected lights form interference fringes on the CCD. Small height changes on the surface of the sample can alter the optical path difference, resulting in phase shift of the fringes. The system reconstructs the three-dimensional surface morphology by analyzing two modes: vertical interference scanning (WLI) and phase-shift interference (PSI). The WLI mode is suitable for measuring step heights ranging from 50nm to 10mm, while the PSI mode compresses the measurement range to 0-3 μ m, achieving 0.1nm RMS repeatability. This non-contact measurement method avoids scratching of soft materials such as polymer films and photoresists by probes, while retaining sub nanometer level vertical resolution.
Vertical resolution:<1nm (sub nanometer level)
Step height accuracy: better than 0.7%
Step height accuracy: 0.1%
Sample reflectivity adaptability range: 0.05%~100%
WLI mode repeatability: 1.0nm RMS
PSI mode repeatability: 0.1nm RMS
3、 Typical application scenarios in the laboratory
For DLC like diamond coatings or anodized films, this precision profilometer can quantitatively characterize the depth and volume of wear pits, and distinguish the morphological differences between plastic deformation and abrasive wear. If the laboratory involves biological materials (such as artificial joints), non-contact measurement can also avoid surface contamination of water containing samples.
Lower limit of sample reflectivity: Reflectivity below 0.5% (such as black photoresist, carbon nanotube film) requires the system to have a high-sensitivity CCD and anti noise algorithm. KLA Profilm3D can be as low as 0.05%.
Step height accuracy vs. repeatability: Accuracy determines the reliability of a single absolute value, while repeatability reflects short-term stability. 0.7% accuracy and 0.1% repeatability are advanced levels.
Automatic splicing capability: If the laboratory frequently tests large-sized wafers (≥ 200mm), it is necessary to confirm the registration error between the XY platform's stroke and the splicing algorithm. In the solution provided by Nikon Technology, the standard 100mm automatic table can cover most samples.
Environmental vibration robustness: The active vibration reduction platform can lower the low-frequency isolation starting point of the precision profilometer to 1Hz, avoiding interference fringe drift caused by building vibration.
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