Amorphous polycrystalline silicon for thin-film applications
Amorphous polycrystalline silicon
Silicon exists in both amorphous and crystalline forms, and between the two forms is partially crystalline silicon. Some crystalline silicon is also called polycrystalline silicon.
The optical constants (n and k) of amorphous silicon and polycrystalline silicon require precise thickness measurements under different deposition conditions. When measuring the thickness, roughness and the possible weathering of silicon film crystallization are also taken into consideration. The complex measurement program provided by the Filmetrics device simultaneously measures and outputs the parameters of each required silicon thin film, and the results are "one-click" available.
Measurement example
Polycrystalline silicon is widely used in silicon-based electronic devices. The efficiency of these devices depends on the optical and structural properties of the film. These characteristics change with the alteration of deposition and annealing conditions, so it is very important to accurately measure these parameters. Between the silicon substrate of the wafer and the polycrystalline silicon, a layer of silica is added to enhance the optical contrast, and both the thickness of the thin film and its optical properties can be measured. F20 can easily measure the thickness and optical constants of polycrystalline silicon films, as well as the thickness of silica interlayers. The Bruggeman optical model was used to measure the optical properties of polycrystalline silicon films.
Measurement Settings
