FilmSense ® FS-8 multi wavelength ellipsometer
The fourth generation multi wavelength elliptical polarization spectroscopy measurement system -8-wavelength LED light source, no moving parts, 1-second acquisition of film thickness and refractive index n& K value
8 LED wavelength range (370-950nm) | 0.0004nm Film thickness precision (1 second acquisition) | 0-5μm Transparent film thickness range (FS-8) | ＞50,000h LED light source lifespan |
产品介绍
FilmSense FS-8 multi wavelength ellipsometerIt is the crystallization of the fourth generation ellipsometry measurement technology, which uses 8 long-life LED light sources (spectral range 370-950nm) and an ellipsoidal polarization detector without moving parts to achieve fast and reliable thin film measurement in a compact system. Unlike a light reflection film thickness gauge, an ellipsometer analyzes the reflection of polarized light before and after reflectionPolarization state change (amplitude ratio PSI and phase difference Δ)To calculate the thickness of thin films, the sensitivity to ultra-thin films is much better than that of reflection methods - the precision of film thickness can reach 0.0004nm, and even sub single atomic layer thin films can be accurately characterized.
The fourth generation FS-8 has added multiple wavelengths compared to the previous generation, including the 370nm ultraviolet wavelengthUltra thin films with a thickness less than 10nmProvide enhanced sensitivity; And the three long wavelengths of 735nm, 850nm, and 950nm makeThe upper limit of transparent film measurement has been extended to 5 μ mAnd can measure polycrystalline silicon SiGe、 Absorbent semiconductor films such as amorphous silicon can also be processed using the Drude modelMeasurement of thin film resistivityThe integrated compact design - with a light source of only 125 × 80 × 60mm and a detector of 110 × 80 × 60mm - coupled with a 12V power supply and Ethernet connection, makes it suitable not only for laboratory desktops, but also for installation on the vacuum chamber flange of thin film deposition equipment, achievingIn situ real-time online ellipsometry measurement.
patent technologyFilmSense FS-8Provide the performance of a full spectrum ellipsometer at the price of a single wavelength ellipsometer. The detector design without moving parts ensures long-term reliability, and the integrated computer and web browser interface makes operation and maintenance extremely simple, without the need for complex software installation.
Why choose FS-8? ——Six core technological advantages
Sub monolayer atomic layer film thickness precisionThe film thickness precision of FS-8 for most samples is better than 0.0004nm (1 second data acquisition), reaching a precision level of sub monolayer thin film thickness. The principle of ellipsometry directly utilizes the phase change of polarized light, and its sensitivity to ultra-thin films (<10nm) far exceeds that of optical reflection methods, making it an ideal tool for measuring the thickness of nanoscale ellipsoidal films.
Covering 8 wavelengths from ultraviolet to near-infraredThe 370nm ultraviolet wavelength provides enhanced sensitivity for ultra-thin film measurements; 735nm, 850nm, and 950nm long wavelengths can measure thicker transparent films (up to 5 μ m) and absorbing semiconductor films (such as polycrystalline silicon, SiGe, amorphous silicon), while supporting the Drude model for thin film resistivity measurement.
【 No moving parts, maintenance free design 】The detector has no moving parts inside and is compatible with LED light sources with a lifespan of over 50000 hours. There is no need to replace expensive lighting fixtures, time-consuming alignment calibration or preventive maintenance procedures. The electric light source polarizer supports automatic calibration and area averaging measurement, further improving the accuracy of ellipsometry measurement.
Model Builder Intelligent Model BuildingElliptical data analysis is usually very complex, and FS-8 is equipped with revolutionary Model Builder functionality. Users only need to answer a few simple questions about the nominal structure of the sample, and the software can automatically establish and test multiple models - from ideal models to non ideal models that include surface roughness and refractive index gradients - and recommend the best fitting model.
In situ online measurement capabilityFS-8 is compatible with standard 2.75-inch or 1.33-inch vacuum flanges and can be directly installed on vacuum chambers of thin film deposition equipment such as MBE, MOCVD, ALD, magnetron sputtering, etc. It can monitor the deposition rate and optical constants (n& k values) in real time and support online ellipsometry monitoring and control of multi-layer film structure deposition.
Compact and Lightweight Browser OperationFS-8 occupies an area of only 180 × 400mm and weighs only 5kg, making it one of the most compact and lightweight multi wavelength ellipsometers on the market. The integrated computer provides a browser access interface through a network interface, without the need to install any software, and can be directly operated and analyzed from any modern computer, laptop, or tablet.
The difference between ellipsometer and light reflection film thickness gauge
Ellipsometer and light reflection film thickness gauge are two mainstream non-contact optical thin film measurement techniques. Light reflectometers (such as Filmetrics F20/F50 series) measure thickness by analyzing the interference spectrum of film reflection, which is easy and fast to operate, suitable for conventional film thickness detection; The ellipsometer is further utilized on this basisPhase variation of polarized lightIt has higher sensitivity to ultra-thin films and can accurately measure both refractive index (n) and extinction coefficient (k) simultaneously. Both have their own strengths and are suitable for different application scenarios:
| comparative dimension | FS-8 multi wavelength ellipsometer | Light reflection film thickness gauge (F20/F50 series) |
|---|
| Measuring principle | Polarization state changes before and after polarized light reflection (PSI, Δ) | Analysis of Reflected Light Interference Spectral Intensity |
| 核心优势 | Ultra thin film has extremely high sensitivity and can directly measure n& K value | Easy and fast operation, wider measurement range (nm mm) |
| Ultra thin film precision | 0.0004nm (sub atomic level) | 0.02nm |
| Typical thickness range | 0-5 μ m (transparent film) | 1nm-3mm (depending on configuration) |
| n& K value determination | Core ability to simultaneously measure thickness and optical constants | When the film thickness is ≥ 50nm, n& k |
| In situ measurement | Support vacuum chamber installation and real-time online monitoring | Usually limited to non in situ desktop measurements only |
| Operational complexity | Need to establish an optical model, simplify with Model Builder | Ready to use, one click measurement |
| Applicable scenarios | Ultra thin film research n& K characterization, in-situ process monitoring | Rapid quality inspection of production line, large-scale thickness detection |
典型应用场景
The core value of FS-8 multi wavelength ellipsometer lies inSimultaneously obtaining film thickness and optical constantsHas unique abilities, particularly adept at precise quantitative characterization of ultra-thin films and measurement of absorbent semiconductor films. The following are the most typical application areas and scenarios:
| application field | Description of Elliptical Polarization Measurement Scene | Typical measurement object |
|---|
| Semiconductor Manufacturing | Accurate thickness and optical constant characterization of ultra-thin films such as gate oxide layers and high-k/low-k dielectrics. The sensitivity of ellipsometry measurement to<10nm thin films far exceeds that of reflection method, making it the preferred technique for ellipsometry measurement of ultra-thin gate dielectrics in advanced processes. The 8 wavelengths of FS-8 can cover the complete spectral range from ultraviolet to near-infrared, meeting the measurement needs of different membrane materials. | SiO ₂ gate oxide layer, SiNx passivation layer, high-k dielectric (HfO ₂, etc.), low-k dielectric, polycrystalline/amorphous silicon thin film, photoresist |
| optical thin film | Accurate measurement of thickness and refractive index of optical coatings such as anti reflective films, high reflectivity films, and filters. The ellipsometer can directly obtain the n& The k value is an ideal choice for optical thin film ellipsometry analysis to determine whether the coating process has achieved the designed optical performance. The diversified analysis function can determine the optical constants of unknown materials by measuring the same thin film of different thicknesses. | SiO ₂/TiO ₂/Ta ₂ O ₅/MgF ₂ anti reflective film, dielectric reflector, bandpass filter, hard coating |
| Tablet display | Measurement of thickness and optical constants of OLED organic functional layer and TCO transparent conductive oxide film. Transparent electrodes such as ITO; The k value has a significant impact on the optical performance of display devices, and ellipsometry is the most effective method for characterizing the ellipsoidal characteristics of transparent conductive films. | ITO transparent conductive film, OLED organic layer (light-emitting layer/injection layer/transport layer), amorphous silicon TFT, polyimide |
| Process development (in-situ monitoring) | Real time monitoring of growth rate and optical constant changes during thin film deposition process. FS-8 can be installed on vacuum chambers of MBE, MOCVD, ALD, and magnetron sputtering equipment to obtain real-time film thickness and n& K-data, supporting online ellipsoidal endpoint control for multi-layer film structure deposition. | Real time monitoring of deposition rate, thin film optical constants (n&k), multi-layer film growth process, and etching depth |
| Photovoltaic solar energy | Characterization of the thickness and optical constants of the anti reflection film and passivation layer in solar cells. Elliptical polarization measurement can accurately control the consistency between the refractive index of the anti reflection film and the design value, improving the photoelectric conversion efficiency of the battery. | SiNx anti reflection film, TCO window layer, amorphous/microcrystalline silicon thin film, passivation layer |
| data storage | Characterization of the thickness and optical properties of ultra-thin film layers such as hard disk protective film and magnetic thin film. The ellipsometer has extremely high sensitivity to ultra-thin diamond-like carbon films such as carbon protective films, and is the standard method for thin film ellipsometry measurement in the data storage industry. | Carbon protective film (DLC), magnetic thin film, lubricating layer |
| Biological and Chemical Sensing | Detecting the adsorption process of sub monolayer materials on functionalized surfaces in a liquid environment. The ellipsometer is extremely sensitive to the surface adsorption layer, and combined with immersion ellipsometry measurement technology and liquid sample pool, it can monitor the binding dynamics of biomolecules on the sensor surface in real time. | Biological coating thickness, self-assembled monolayer (SAM), protein adsorption layer, antigen antibody binding |
| Industrial online monitoring | Online monitoring of film thickness and optical constants on the production line. FS-8 supports external software control such as LabVIEW through the FS-API interface, and can be integrated into automated production lines to achieve online ellipsoidal film thickness monitoring. | Uniformity of large-area coating, online film thickness on the production line, and automated quality control |
测量原理
The FS-8 multi wavelength ellipsometer is based on the principle of ellipsometry for non-contact measurement of film thickness and optical constants. The core workflow is as follows: the light emitted by the LED light source passes through a polarizer to form linearly polarized light with a known polarization state, and is irradiated onto the surface of the thin film sample at a fixed incident angle of 65 °. After reflection and interference of light at the upper and lower interfaces of the film, the polarization state of the reflected light changes from linear polarization to elliptical polarization - this change is determined by the thickness, refractive index (n), and extinction coefficient (k) of the film. The detector analyzes the relationship between the P-polarization component and the S-polarization component in the reflected lightAmplitude ratio (PSI) and phase difference (Δ)By fitting with an optical model, accurately calculate the film thickness and optical constants (n&k values).
The core difference between ellipsometry and light reflection is that reflection only analyzes the intensity of reflected light (interference spectrum), while ellipsometry simultaneously utilizesIntensity and phaseTwo dimensions, therefore, it has higher sensitivity to ultra-thin films and can directly determine the n and k values of thin films without relying on known material optical constant databases. The 8 LED wavelengths of FS-8 cover the spectral range of 370-950nm, and the electric light source polarizer supports automatic calibration and regional average measurement, ensuring measurement accuracy and long-term stability.
测量能力与表现
The FS-8 multi wavelength ellipsometer performs excellently in measuring the thickness and refractive index of transparent single-layer films. The upper limit of transparent film thickness is usually 2-5 μ m, depending on the ellipsometer configuration and the optical constants of the substrate/film. To obtain accurate refractive index measurement results, the film thickness generally needs to be greater than 10nm.
ForAbsorbent film(such as metal thin films, polycrystalline silicon, etc.), data analysis is more complex, but FilmSense software provides multiple options for determining n& The method of k value:
Diversified analysisDetermine optical constants by measuring the same thin film of different thicknesses
Combined measurement of ellipsometry and transmittanceCombining two types of data to improve the accuracy of absorption membrane analysis
Immersion ellipsometry measurementMeasurement in a liquid environment using a liquid sample pool
Dispersion model fittingAnalyze using physical models such as Cauchy, Tauc Lorentz, Drude, etc
The upper limit of the thickness of the absorption film is closely related to the material type, and the upper limit of the metal film is usually about 50nm. FS-8 can also be measuredMultilayer thin film stacking(sometimes up to 5 layers), can be simulated in FilmSense software to determine the feasibility of specific sample structures, and for some samples, can also characterize the properties in the filmSurface roughness and refractive index gradient.
Comparison of FilmSense series wavelengths
The FilmSense fourth generation ellipsometer series offers two models, FS-4 and FS-8, with the main differences being the number of wavelengths and spectral coverage range. FS-4 is an economical 4-wavelength configuration, while FS-8 is a high-precision 8-wavelength full spectrum configuration.
| System Model | intergenerational | wavelength number | 370nm | 450nm | 525nm | 595nm | 660nm | 735nm | 850nm | 950nm |
|---|
| FS-1 | Gen.2& three | 4 |
|
| ✓ | ✓ | ✓ | ✓ |
|
|
| FS-1EX | Gen.2& three | 6 |
| ✓ | ✓ | ✓ |
| ✓ |
| ✓ |
| FS-4 | Gen.4 | 4 |
|
| ✓ | ✓ | ✓ | ✓ |
|
|
| FS-8 | Gen.4 | 8 | ✓ | ✓ | ✓ | ✓ | ✓ | ✓ | ✓ | ✓ |
FS-8 covers a complete range of 8 wavelengths (370-950nm) and has full functionality for measuring ultra-thin films, thick transparent films, absorbing semiconductor films, and thin film resistivity.
产品参数
| Product model | FS-8 (Fourth Generation) | Place of Origin | United States |
| wavelength number | 8 (370, 450, 525, 595, 660, 735, 850, 950 nm) | spectral range | 370 – 950 nm |
| light source | Long life LED (>50000 hours) | detector | Elliptical polarization detector without moving parts |
| angle of incidence | 65° | Beam size | 4 × 9mm (optional 0.8 × 1.9mm or 0.25 × 0.55mm) |
| Film thickness precision | Better than 0.0004nm (most samples, collected in 1 second) | Repeatability of film thickness | 0.015nm |
| Measurement range of transparent film | 0 – 5μm | sample size | Maximum 200mm diameter, 20mm thickness |
| Sample installation method | Manual placement, manual height adjustment | Sample deflection range | ±2° |
| floor area | 180 × 400 mm | weight | 5kg |
| Light source size | 125 × 80 × 60 mm | detector size | 110 × 80 × 60 mm |
| connection method | 12V power supply, Ethernet, light source detector link cable | Electric light source polarizer | Support automatic calibration and regional average measurement |
| software interface | Web browser interface (Windows/Mac OS/tablet) | Analysis function | Model Builder automatic modeling, diverse analysis, dispersion model |
| Optional accessories | Focused beam (spot size 0.8 × 1.9mm or 0.25 × 0.55mm), liquid sample cell, in-situ vacuum flange adapter, automatic Mapping sample stage (FS-RT300), FS-API external software control interface |
| For more parameters and customized configurations, please contact us for more information |
Live demo
客户评价
Our laboratory purchased four FilmSense ellipsometers - three FS-1 and one FS-1EX with an RT300 Mapping sample stage. The FilmSense software is the most intuitive and user-friendly among all ellipsometers I have used. The diversified analysis function only requires measuring a small number of samples with different thicknesses to determine the optical constants of new materials, and the entire process only takes a few minutes. The sample height automatic adjustment function of RT300 is also excellent, greatly reducing the time for manual focusing. ”
——Large scale semiconductor OEM system engineering department
FS-1 is an excellent basic ellipsometer, reliable, easy to use, almost maintenance free, and highly cost-effective. The FilmSense team has provided great assistance in characterizing thin films and obtaining accurate measurement results, and is strongly recommended for laboratories that require entry-level ellipsometers. ”
——Dr. Ruy Sebastian Bonilla, Researcher at the Department of Materials Science, Oxford University
The FS-8 ellipsometer is running well and the number of users continues to increase. I always recommend this equipment to new users when training them to use ALD deposition systems. The measurement results are accurate and reliable, and the technical support responds quickly and professionally. The Model Builder feature is particularly user-friendly for new users, greatly reducing the learning threshold for ellipsoidal data analysis. ”
——Tony Whipple, Researcher at Minnesota Nanotechnology Center
Frequently Asked Questions (FAQ)
What is the difference between FS-8 ellipsometer and Filmetrics film thickness gauge?
The two use completely different optical measurement principles: Filmetrics film thickness gauge (such as F20) is based on spectral reflectance method, which measures thickness by analyzing the interference spectral intensity of film reflection. It is easy to operate and has a wide measurement range (nm mm); The FS-8 ellipsometer is based on the ellipsometry method, which simultaneously measures thickness and optical constants (n&k) by analyzing the polarization state changes (amplitude ratio PSI and phase difference Δ) before and after polarized light reflection. It has a much higher sensitivity to ultra-thin films than the reflection method, with a film thickness precision of up to 0.0004nm (sub atomic level), and can directly measure the refractive index and extinction coefficient of materials. Simply put, a reflectometer is like a "card camera" - easy and fast to operate; An ellipsometer is like a "professional DSLR" - it provides richer and more precise data, but requires the establishment of an optical model.
What are the functions of the 8 wavelengths of FS-8?
Different wavelengths cater to different measurement requirements: 370nm ultraviolet wavelength provides enhanced measurement sensitivity for ultra-thin films with a thickness<10nm; The visible light range of 450-660nm covers most conventional transparent film measurements; The three long wavelengths of 735nm, 850nm, and 950nm are used to measure thicker transparent films (up to 5 μ m) and absorbing semiconductor films (such as polycrystalline silicon, SiGe, amorphous silicon), while supporting the Drude model for thin film resistivity measurement. The complete combination of 8 wavelengths makes FS-8 a versatile ellipsoidal film thickness measurement device, covering various measurement needs from sub nanometer ultra-thin films to micrometer thick films.
What types of thin films can FS-8 measure?
FS-8 can measure most transparent films (0-5 μ m), including SiO ₂ SiNx、 Photoresist, polymer, ITO transparent conductive film, etc; For absorbent films such as metal films and polycrystalline silicon, the upper limit of thickness is usually 50nm. FS-8 can also perform multi-layer film stacking measurements (up to 5 layers) and characterize the surface roughness and refractive index gradient of the film. The specific applicability of the sample can be confirmed through software simulation or evaluated by contacting our application engineers.
Can FS-8 be measured in situ in a vacuum chamber?
Sure, this is one of the core functions of FS-8. FS-8 provides standard 2.75-inch and 1.33-inch vacuum flange adapters, which can install the light source and detector unit onto the vacuum chamber of thin film deposition equipment such as MBE, MOCVD, ALD, magnetron sputtering, etc., and monitor the film deposition rate, optical constants (n&k values), and film thickness changes in real-time in situ. The FS-API interface supports external software control such as LabVIEW to achieve online ellipsometry monitoring and endpoint control of thin film deposition processes.
What is the Model Builder feature of FS-8?
Model Builder is a revolutionary automated modeling feature in FS-8 software. Elliptical data analysis usually requires the establishment of a physical model for fitting, which poses a certain threshold for beginners. Model Builder automatically builds and tests multiple models by guiding users to answer a few simple questions about the nominal structure of the sample - from simple models with ideal optical constants to non ideal models that include surface roughness and refractive index gradients - ultimately recommending the best fitting model for the sample.
How to choose between FS-8 and FS-4?
FS-4 is the fourth generation economical 4-wavelength ellipsometer (450-660nm), suitable for measuring 0-2 μ m transparent single-layer thin films with a precision as low as 0.0004nm. FS-8 is the fourth generation high-precision 8-wavelength ellipsometer (370-950nm), which not only has all the functions of FS-4, but also adds ultraviolet wavelength (370nm) for ultra-thin enhancement measurement, and three long wavelengths (735/850/950nm) for thick film and absorbing semiconductor film measurement. If the application mainly uses single-layer transparent film, FS-4 is sufficient; If it involves ultra-thin films, absorbent films, or multilayer films, it is recommended to choose FS-8.
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查看详情 →Free sample testing service
Free Sample Testing Service
Not sure if your film sample is suitable for FS-8 ellipsometry measurement? We offer free sample testing services! Send us the samples, and our professional engineers will use the FS-8 multi wavelength ellipsometer to test the film thickness and optical constants for you, and provide detailed measurement reports and analysis recommendations.
