KLA Zeta-388 optical profilometer

The KLA Zeta-388 optical profilometer provided by Unicon Technology adopts ZDot patented technology and multi-mode optical system, which is a non-contact three-dimensional (3D) surface morphology measurement system. The system integrates six different optical measurement techniques, including white light interferometry, Nomasky interferometry contrast microscopy, shear interferometry, and spectral reflectance thickness measurement. The ZDot measurement mode can simultaneously capture high-resolution 3D morphology information and true color infinite focus images of the sample surface. Zeta-388 adds a cassette to cassette wafer transfer robotic arm on the basis of Zeta-300, supporting fully automatic measurement, integrated seismic platform, and SECS/GEM communication protocol. Measurement capabilities include: sub nanometer to millimeter step height, sub nanometer to sub millimeter surface roughness (including waviness analysis), transparent film thickness from 30nm to 100 μ m, 2D/3D film stress, 2D/3D wafer warpage and shape. Automatic defect detection can identify defects with lateral dimensions greater than 1 μ m. Suitable for fields such as semiconductors and compound semiconductors, wireless communication devices (SAW/BAW/FBAR), LEDs (including PSS patterned sapphire substrates), wafer level packaging (WLCSP/FOWLP), MEMS microelectromechanical systems, PCBs and flexible circuit boards, medical devices, and microfluidic components. Younikon Technology provides professional technical support.

Name：光学轮廓仪

Brand： KLA

Model： Zeta-388

Origin：美国

KLA Zeta-388 Optical profiler

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The KLA Zeta-388 optical profilometer provided by Unicon Technology adopts ZDot technology and multi-mode optical system, which is a non-contact three-dimensional (3D) surface morphology measurement system. The system integrates six different optical measurement techniques, including white light interferometry, Nomasky interferometry contrast microscopy, shear interferometry, and spectral reflectance thickness measurement. The ZDot measurement mode can simultaneously capture high-resolution 3D morphology information and true color infinite focus images of the sample surface. Zeta-388 adds a cassette to cassette wafer transfer robotic arm on the basis of Zeta-300, supporting fully automatic measurement, integrated seismic platform, and SECS/GEM communication protocol. Measurement capabilities include: sub nanometer to millimeter step height, sub nanometer to sub millimeter surface roughness (including waviness analysis), transparent film thickness from 30nm to one hundred μ m, 2D/3D film stress, 2D/3D wafer warpage and shape. Automatic defect detection can identify defects with lateral dimensions greater than 1 μ m. Suitable for fields such as semiconductors and compound semiconductors, wireless communication devices (SAW/BAW/FBAR), LEDs (including PSS patterned sapphire substrates), wafer level packaging (WLCSP/FOWLP), MEMS microelectromechanical systems, PCBs and flexible circuit boards, medical devices, and microfluidic components. Younikon Technology provides professional technical support.

KLA Zeta-388 Optical Profilometer Product Introduction:

KLA Zeta-388Optical profilerIt is a non-contact 3D surface morphology measurement system. The system is inZeta-300On the basis of the optical profiler, a robotic arm operating system for fully automatic measurement has been added.Zeta-388Optical profileradoptZDotTechnology and multi-mode optical systems can measure various types of samples, including transparent and opaque, low to high reflectivity, smooth to rough surfaces, and step heights ranging from sub nanometer to millimeter levels.KLA Zeta-388Optical profilersupportOCRandSECS/GEMThus, it can be used for the production and manufacturing of fully automated production lines.

KLA Zeta-388 Optical Profilometer Product Features:

Fast non-contact 3D optical profilometer
Multi mode group optical system provided3DScanning, differential interferometry, thin film thickness, and automatic defect detection
Fully automatic measurement
Simultaneously extract true color information and morphology information from the sample surface
support100to200mmThe wafer
supportOCRandSECS/GEMSuitable for production environments on automated production lines
The user interface is simple and intuitive

KLA Zeta-388 The main applications of optical profilometer are:

The step height from nanometer to millimeter level can be used for measuring high aspect ratio steps
Surface roughness analysis from sub nanometer to sub millimeter level, suitable for smooth and rough surfaces
ZHigh resolution white light interferometry measurement can be used for wide area step height measurement
Phase shifted scanning interferometry technology can quickly measure less than250nmThe height of the steps
Measurement of film stress and sample warpage
measurement30nmto100μmThe thickness of the transparent film can provide uniformity data and thickness distribution map of the film
Automatic defect detection, capable of identifying horizontal dimensions greater than1μmdefects

Measurement principle of KLA Zeta-388 optical profilometer product:

KLA Zeta-388 Optical profiler‌the principle‌It is achieved through the principle of confocal microscopy to achieve high-resolution and high contrast optical slicing capability of the sample. It combines the characteristics of traditional optical microscopes and laser confocal microscopes, using broad-spectrum white light as the light source and eliminating defocused light interference through spatial filtering mechanism to obtain high-precision 3D images

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