KLA R54 four probe resistivity measuring instrument | dual-mode fully automatic resistivity mapping system

KLA R54 four probe resistivity measuring instrument

Name: KLA R54 四探针电阻率测量仪
Brand: KLA
Availability: InStock

Contact type four point probe (4PP)+non-contact eddy current (EC) dual-mode technology | Fully automatic resistivity mapping system

KLA R54 四探针电阻率测量仪

10¹⁰

Measurement range (order of magnitude)

1mΩ/sq

Low to range

<0.02%

4PP repeatability

300mm

Maximum sample size

15mm

Z-axis travel

4PP/EC

双模技术

产品介绍

KLA R54 四探针电阻率测量仪 Adopting a dual-mode technology of four point probe (4PP) and non-contact eddy current (EC), the measurement range covers 10 orders of magnitude (as low as 1m Ω/sq), and the 4PP repeatability is better than 0.02%. The device is equipped with dynamic correction of boundary effects and compensation for probe spacing errors, and the enclosed housing is suitable for photosensitive and environmentally sensitive samples.

Support fully automatic mapping of 200mm/300mm wafers or A4 square samples. RSMapper software supports rectangular, linear, polar coordinate, and custom test point modes, and can generate two-dimensional and three-dimensional distribution spectra of metal film uniformity, ion implantation doping and annealing characterization, film thickness/resistivity, etc. Suitable for industries such as semiconductor wafers, compound semiconductors, solar cells (including TOPCon), LEDs, flat panel/VR displays, advanced packaging, printed circuit boards, and flexible wearable electronics.

industry benchmark

KLA R54 It is an ideal tool for measuring thin film resistance in the semiconductor and general semiconductor industries, meeting the resistance monitoring and thickness measurement needs of various conductive thin films from semiconductor manufacturing to flexible electronic products.

核心优势

Dual mode technology (4PP+EC)

Contact type four point probe and non-contact eddy current, covering 10 orders of magnitude measurement range, flexibly responding to different conductive thin film materials.

Dynamic correction of boundary effects

Built in boundary effect compensation and probe spacing error correction ensure measurement accuracy in edge areas.

Large scale fully automatic mapping

Supports 300mm wafers or A4 square samples, high-precision XY platform, automatic EC probe height error correction.

Closed photosensitive protection

A closed system is convenient for measuring photosensitive or environmentally sensitive samples and is suitable for sensitive processes such as photolithography and solar cells.

High precision and repeatability

4PP measurement point repeatability<0.02%, EC repeatability<0.2%, compatible with KLA's full range of thin film resistance probes.

RSMapper visualization software

Intuitive interface, supporting rectangular/linear/polar coordinates/custom dot matrix, real-time generation of 2D/3D resistivity distribution maps.

Typical application areas

semiconductor wafer

Compound semiconductor

Tablet/VR display

advanced packaging

太阳能电池

printed circuit board

wearable devices

conductive material

Characterization of ion implantation

Uniformity of metal thin film

LED/OLED

TOPCon process

测量原理

Four point probe (4PP)

Four conductive probes contact the surface of the conductive layer with controllable force, with the outer probe applying current and the inner probe measuring voltage. The thickness of the conductive layer should be less than half of the probe spacing. KLA R54 adopts dual-mode technology, supports interval probe voltage measurement, and is equipped with dynamic correction of boundary effects and compensation for probe spacing errors. It is suitable for most conductive thin films or ion implantation layers.

Eddy current (EC)

Non contact measurement technology. By applying a time-varying current through the coil, a time-varying magnetic field is generated, inducing eddy currents on the conductive surface. The reverse magnetic field generated by the eddy currents couples with the probe coil, and the signal change is proportional to the sample resistance. KLA's unique EC technology allows for dynamic adjustment of the probe height at each measurement point, unaffected by probe size or surface oxidation, making it suitable for soft or non 4PP samples.

产品参数

Product model	R54 (4PP/EC dual configuration)	brand	KLA
measurement technology	Four point probe (4PP)/eddy current (EC)	测量范围	Spanning 10 orders of magnitude (as low as 1m Ω/sq)
4PP repeatability	<0.02%	EC repeatability	<0.2%
XY platform itinerary	Supports 200mm/300mm wafers or A4 square samples	Z-axis travel	15mm (automatic)
Maximum load-bearing capacity of the sample stage	2.5kg	Maximum height of sample	15mm
Surveying mode	Rectangular, linear, polar coordinates, custom dot matrix
software	RSMapper (Data Acquisition/Analysis/2D-3D Visualization)
Probe compatibility	Compatible with all KLA thin film resistance measurement probes
special function	Closed shell (photosensitive protection), automatic EC probe height error correction
For more customized configurations, please contact Younikon Technology

产品应用详解

Uniformity of metal thin film

Both 4PP/EC can measure the uniformity of metal film resistance, and the two are highly correlated. EC is recommended for thicker and more conductive metal films, while 4PP is suitable for thinner metal films (>10 Ω/sq). The resistance distribution diagram characterizes the uniformity of thin films and process fluctuations.

Characterization of ion implantation

The 4PP method is a standard measurement technique for ion implantation processes. Test the injection distribution after hot annealing to identify hot/cold spots and changes in injection dose.

Film thickness/resistivity

By inputting the material resistivity, the film thickness distribution can be calculated; Or input film thickness data to calculate resistivity distribution, flexibly adapting to different analysis requirements.

Data Collection and Visualization

RSMapper software integrates data collection and powerful analysis functions, with an intuitive visual interface that allows for easy setting of measurement points and supports offline use.

Measurement data display

Typical thin film resistance distribution map and mapping visualization results

客户评价

The dual-mode technology of KLA R54 greatly simplifies the measurement process of metal film resistance in our wafer fab. The EC non-contact method protects the soft metal layer, while 4PP is used for high-precision characterization. The enclosed shell is very suitable for environmentally sensitive samples in the lithography section. ”

——Yield Engineering Department of Semiconductor Wafer Manufacturing Plant

ITO and silver paste resistance uniformity monitoring for TOPCon process of solar cells, R54 boundary effect correction makes edge measurement data more reliable, and the 300mm platform meets the requirements of large-sized silicon wafers. ”

——Process Integration Department of Photovoltaic Cell Manufacturer

常见问题

How to choose between 4PP and EC modes?+

4PP is suitable for thinner metal films (>10 Ω/sq) and ion implantation layers, with higher accuracy; EC is suitable for thick and highly conductive metal films, soft surfaces, or easily oxidizable materials, and non-contact measurement does not damage the sample. The results of the two modes are highly correlated and can be mutually verified.

What is the maximum sample size supported by R54?+

It can be configured to accommodate 300mm circular wafers or A4 square samples (210mm × 297mm), with XY platform automatic mapping, Z-axis stroke of 15mm, and maximum sample height of 15mm.

What are the benefits of a closed enclosure?+

A closed system can effectively isolate ambient light and environmental sensitive factors, making it suitable for measuring photosensitive materials such as photoresist and solar cells, and avoiding external influences on sample performance.

Can I customize the measurement points?+

Okay. RSMapper software supports multiple preset modes such as rectangular, linear, polar coordinates, and also allows users to customize an unlimited number of measurement points, completing recipe creation within minutes.

Can R54 measure film thickness?+

It can be indirectly measured. By inputting the resistivity of a known material, R54 can calculate the film thickness distribution based on the resistance value; On the contrary, the input thickness can calculate the resistivity distribution, which is suitable for monitoring the thickness of conductive thin films.

Free sample testing service

Free Sample Testing Service

Not sure if your conductive film sample is suitable for 4PP or EC measurement? We offer free sample testing services! Send samples, professional engineers will use KLA R54 to conduct thin film resistance/square resistance testing for you, and provide detailed measurement reports and scheme recommendations.

Tags: KLA 四探针电阻率测量