KLA R50 Four Probe Thin Film Square Resistance Tester | Contact/Non Contact Dual Mode Resistance Measurement System

KLA R50 Four Probe Thin Film Square Resistance Tester

Name: KLA R50 四探针薄膜方阻测试仪
Brand: KLA
Availability: InStock

Contact type four point probe (4PP)+non-contact eddy current (EC) dual-mode technology | Fully automatic Mapping resistivity measurement system

KLA R50 四探针薄膜方阻测试仪

10¹⁰

Measurement range (order of magnitude)

±0.2%

4PP measurement accuracy

200mm

XY electric platform

60mm

Z-axis travel

4PP/EC

Dual-mode technology

产品介绍

KLA R50 四探针薄膜方阻测试仪 We provide two measurement schemes: contact four point probe (4PP) and non-contact eddy current (EC), with a measurement range spanning 10 orders of magnitude and a 4PP accuracy of up to ± 0.2%. KLA has developed dual-mode technology on R50, equipped with dynamic correction of boundary effects and compensation for probe spacing errors, compatible with all KLA thin film resistance measurement probes.

The 200mm XY electric platform supports multiple surveying modes such as rectangular, linear, polar coordinates, and customization, and the RSMapper software is flexible and easy to use. Suitable for industries such as semiconductor wafer manufacturing, compound semiconductors, flat panel and VR displays, advanced packaging, solar cells, printed circuits, wearable devices, and conductive materials.

industry benchmark

KLA R50 It is an ideal tool for measuring thin film resistance in the semiconductor and general semiconductor industries, meeting the resistance monitoring and thickness measurement needs of various conductive thin films from semiconductor manufacturing to flexible electronic products.

核心优势

双模技术

Contact type four point probe (4PP)+non-contact eddy current (EC), covering 10 orders of magnitude measurement range, flexibly responding to different conductive thin film materials.

Dynamic correction of boundary effects

Built in boundary effect compensation and probe spacing error correction ensure measurement accuracy in edge areas.

Fully automatic mapping

200mm XY electric platform, supporting rectangular, linear, polar coordinates and custom mapping modes, with RSMapper software for visualizing resistance distribution maps.

high-precision measurement

4PP accuracy ± 0.2%, EC accuracy ± 1%, and measurement point repeatability better than 0.02%.

Flexible probe compatibility

Compatible with KLA's full range of thin film resistance measurement probes, suitable for different surface materials and process requirements.

Typical application areas

semiconductor wafer

化合物半导体

Tablet/VR display

advanced packaging

太阳能电池

printed circuit

wearable devices

conductive material

Characterization of ion implantation

Uniformity of metal thin film

Film thickness/resistivity

LED/OLED

测量原理

Four point probe (4PP)

Four conductive probes contact the surface of the conductive layer with controllable force, with the outer probe applying current and the inner probe measuring voltage. The thickness of the conductive layer should be less than half of the probe spacing. The KLA R50 adopts dual-mode technology, supports interval probe voltage measurement, and is equipped with dynamic correction of boundary effects and compensation for probe spacing errors. It is suitable for most conductive thin films or ion implantation layers.

Eddy current (EC)

Non contact measurement technology. By applying a time-varying current through the coil, a time-varying magnetic field is generated, inducing eddy currents on the conductive surface. The reverse magnetic field generated by the eddy currents couples with the probe coil, and the signal change is proportional to the sample resistance. KLA's unique EC technology allows for dynamic adjustment of the probe height at each measurement point, unaffected by probe size or surface oxidation, making it suitable for soft or non 4PP samples.

产品参数

Product model	R50 (4PP/EC dual configuration)	brand	KLA
measurement technology	Four point probe (4PP)/eddy current (EC)	测量范围	Across 10 orders of magnitude
4PP accuracy	±0.2%	EC accuracy	±1%
Measurement point repeatability (4PP)	<0.02%	Measurement point repeatability (EC)	<0.2%
XY electric platform	200mm × 200mm	Z-axis travel	60mm (automatic)
Maximum load-bearing capacity of the sample stage	2.5kg	Tilted sample stage	± 5 ° manual
Surveying mode	Rectangular, linear, polar coordinates, custom dot matrix
software	RSMapper (Data Acquisition/Analysis/Visualization)
Probe compatibility	Compatible with all KLA thin film resistance measurement probes
For more customized configurations, please contact Younikon Technology

产品应用详解

Uniformity of metal thin film

Both 4PP/EC can measure the uniformity of metal film resistance, and the two are highly correlated. EC is recommended for thicker and more conductive metal films, while 4PP is suitable for thinner metal films (>10 Ω/sq). The resistance distribution diagram characterizes the uniformity of thin films and process fluctuations.

Characterization of ion implantation

The 4PP method is a standard measurement technique for ion implantation processes. Test the injection distribution after hot annealing to identify hot/cold spots and changes in injection dose.

Film thickness/resistivity

By inputting the material resistivity, the film thickness distribution can be calculated; Or input film thickness data to calculate resistivity distribution, flexibly adapting to different analysis requirements.

Data Collection and Visualization

RSMapper software integrates data collection and powerful analysis functions, with an intuitive visual interface that allows for easy setting of measurement points and supports offline use.

Measurement data display

Typical Film Resistance Distribution Diagram& Mapping visualization results

客户评价

The dual-mode technology of KLA R50 greatly simplifies the measurement process of metal film resistance in our wafer fab. The EC non-contact method protects the soft metal layer, while 4PP is used for high-precision characterization. The resistance distribution map of RSMapper is very intuitive. ”

——Yield Engineering Department of Semiconductor Wafer Manufacturing Plant

For monitoring the uniformity of ion implantation in compound semiconductors, the boundary effect correction function of R50 makes the measurement data of edge die more reliable and has excellent repeatability, making it a powerful tool for our process control. ”

——Process integration of compound semiconductor manufacturers

常见问题

How to choose between 4PP and EC modes?+

4PP is suitable for thinner metal films (>10 Ω/sq) and ion implantation layers, with higher accuracy; EC is suitable for thick and highly conductive metal films, soft surfaces, or easily oxidizable materials, and non-contact measurement does not damage the sample. The results of the two modes are highly correlated and can be mutually verified.

What is the maximum sample size supported by R50?+

Configure a 200mm XY electric platform that supports up to 200mm x 200mm samples (such as 8-inch wafers), with a Z-axis stroke of 60mm for automatic focusing and a load-bearing capacity of 2.5kg.

What is the function of dynamic correction of boundary effects?+

When measuring near the edge of the sample, the current distribution will be affected, resulting in resistance measurement deviation. Dynamic correction of boundary effects automatically compensates for edge effects, ensuring consistent and accurate measurement data from the center to the edge.

Can I customize the measurement points?+

Okay. RSMapper software supports multiple preset modes such as rectangular, linear, polar coordinates, and also allows users to customize an unlimited number of measurement points, completing recipe creation within minutes.

Can R50 measure film thickness?+

It can be indirectly measured. By inputting the resistivity of a known material, R50 can calculate the film thickness distribution based on the resistance value; On the contrary, the input thickness can calculate the resistivity distribution, which is suitable for monitoring the thickness of conductive thin films.

Free sample testing service

Free Sample Testing Service

Not sure if your conductive film sample is suitable for 4PP or EC measurement? We offer free sample testing services! Send samples, professional engineers will use KLA R50 to conduct thin film resistance/square resistance testing for you, and provide detailed measurement reports and scheme recommendations.

Tags: KLA 四探针