Filmetrics F20 Optical Film Thickness Meter

Unicorn Technology distributes the Filmetrics F20 optical film thickness meter under KLA. It delivers non-contact measurement and can measure film thickness ranging from 1 nm to 3 mm within 1 second with an accuracy up to 0.02 nm. Equipped with a built-in database of over 500 materials, it enables measurements of thin films for semiconductors, OLEDs, optical coatings, polymers and more without model building. Free sample testing is available, and engineers provide online model selection support. Feel free to contact us for more details!

  • Name Optical Film Thickness Meter
  • Brand Filmetrics
  • Model F20
  • Origin USA

Filmetrics F20 Optical Film Thickness Gauge

High-precision benchtop film thickness measurement system - results in 1 second, non-contact measurement from 1nm to 3mm


Filmetrics F20 Optical Film Thickness Gauge in laboratory working state

1nm~3mm
Thickness measurement range
0.02nm
Measurement accuracy
<1 second
Single measurement time
500+
Built-in material database

Product Introduction

Filmetrics F20 Optical Film Thickness Gauge is the industry's best-selling benchtop film thickness measurement instrument. As a high-performance non-contact film thickness gauge, it can accurately measure film thickness, optical constants (n and k values), as well as reflectance and transmittance within seconds. Simply connect via USB to a computer and complete installation in minutes. Built on a modular design, the F20 is an ideal optical film thickness measurement system for fields such as semiconductor film thickness measurement, display technology, optical coatings, and biomedical applications. Whether in R&D laboratories or production line QC, the F20 can serve as a primary precision film thickness measurement tool, helping you easily characterize film layers from nanometers to millimeters.

Industry Recognition
Filmetrics F20 has shipped thousands of units since its launch, deployed in thousands of scenarios worldwide. It has won the Photonics Spectra "Circle of Excellence" Award, being recognized as one of the top 25 innovative photonics products globally. With over two decades of continuous iteration, it is one of the most widely used benchtop film thickness measurement systems in global laboratories, and a preferred film thickness measurement instrument for many semiconductor and optoelectronics companies.

Product Features

  • 【Non-Contact Measurement】As a true non-contact film thickness measurement instrument, it avoids damaging thin films, making it especially suitable for fragile or sensitive materials such as photoresists and biological coatings, meeting the non-destructive requirements of semiconductor film thickness detection.

  • 【High Precision and Wide Range】Vertical resolution up to 0.02nm, thickness measurement range covers 1nm to 3mm, not only capable of ultra-thin film thickness measurement at the nanoscale, but also handling thicker coatings, making it a truly precision film thickness measurement system.

  • 【Versatile Applications】Whether transparent, semi-transparent, or low absorption coefficient films, they can all be measured. Covers solid, liquid, and gaseous films, meeting diverse needs such as OLED film thickness measurement, optical coating thickness measurement, and polymer film thickness detection.

  • 【Rapid Measurement】Once configured, thickness and optical constant results are obtained within 1 second, greatly improving film thickness measurement efficiency, making it a powerful assistant for rapid film thickness detection on production lines.

Measurement Principle

The F20 employs the principle of light reflection interference. Incident light reflects off the upper and lower surfaces of the thin film, and the two reflected beams interfere with each other to form an oscillating spectrum. By analyzing the oscillation frequency of the spectrum, the film thickness can be precisely calculated (the denser the oscillation, the thicker the film layer), while also deriving optical constants such as refractive index (n) and extinction coefficient (k) - this is the core technical foundation of optical film thickness measurement instruments.

Schematic diagram of thin film interference measurement principle - incident light reflects at upper and lower film interfaces producing interference spectrum

Applicable Film Types

  • Film characteristics:Thickness, reflectivity, transmittance, optical constants, uniformity, etching amount, etc.

  • Film types:Transparent and semi-transparent films, commonly including oxides, nitrides, polymers, photoresists, ITO, etc.

  • Film states:Solid, liquid, and gaseous films can all be measured

  • Film structures:Single-layer films, multi-layer films; both flat and curved samples can be accommodated

Common Industrial Applications

Semiconductor Films

Display Technology

Consumer Electronics

Parylene/Biomedical

Photoresist

OLED

Waterproof Coatings

Electronic Products/PCBs

Dielectric Layers

ITO and TCOs

RFID

Magnetic Materials

Gallium Arsenide

Air Gap Thickness

Solar Cells

Medical Device Coatings

Product Parameters

Wavelength Range

380-1050nm

Light Source

Halogen Lamp

Thickness Range

15nm~70μm

Measurement Accuracy

0.02nm

Spot Size

1.5mm (optional down to 20μm)

Sample Stage Size

1mm~300mm

F20 Series Selection Guide

ModelThickness RangeWavelength RangeTypical Applications
F20-UV1nm~40μm190~1100nmUltra-thin films (OLED, photoresist)
F20-UVX1nm~250μm190~1700nmWide spectrum ultra-thin films
F2015nm~70μm380~1050nmUniversal (semiconductor, polymer)
F20-EXR15nm~250μm380~1700nmThicker films (optical coatings)
F20-NIR100nm~250μm950~1700nmNear-infrared film measurement
F20-XT0.2μm~450μm1440~1690nmThick film measurement (silicon films)

Not sure which model to choose? Contact an engineer for recommendations

Actual Measurement Data Display

Silicon dioxide film thickness measurement fitting curve on silicon substrate

Silicon oxide film thickness measurement data report showing thickness values and optical constants

Customer Reviews

"Previously, using a profilometer required sample preparation every time, which was very time-consuming. After switching to the F20 film thickness gauge, non-contact measurement saves us 80% of pre-processing time. The 0.02nm accuracy is fully sufficient for our coating processes. This optical film thickness measurement device is easy to install - the engineer only took 5 minutes to train our team."

—— Process Department, Domestic Semiconductor Materials Manufacturer

"The Filmetrics F20 is the most frequently used film thickness measurement device in our laboratory. The built-in database with over 500 materials covers basically all our daily R&D needs. From OLED organic layers to encapsulation adhesives, it's one-click measurement with stable and reliable data - a very practical film thickness measurement instrument."

—— R&D Center, Display Panel Manufacturer

Frequently Asked Questions (FAQ)

What is the measurement principle of the F20 film thickness gauge?

As an optical film thickness gauge, the F20 employs the light reflection interference principle for non-contact measurement. Incident light penetrates the film layer, reflects off both the upper and lower surfaces, and produces an interference spectrum. By analyzing the oscillation frequency of the spectrum, the film thickness and optical constants (n and k values) are calculated, with results available within 1 second - this is a typical optical film thickness measurement method.

What types of films can the F20 measure?

Essentially all smooth, semi-transparent, or low-absorption coefficient films can be measured using this film thickness measurement instrument, including semiconductor materials (SiNx, amorphous silicon), polymers (SU-8 photoresist, parylene), transparent conductive films (ITO), optical coatings (TiO2, DLC), etc. Solid, liquid, and gaseous films are all measurable, and both single-layer and multi-layer stacked films are equally applicable, perfectly covering all types of film thickness measurement needs.

What is the measurement accuracy of the F20?

The precision film thickness measurement system of the F20 series can achieve accuracy of 0.02nm (Ångström-level resolution), with accuracy of 1nm or 0.2% of the measured thickness (whichever is greater), and stability as high as 0.05nm. For ultra-thin film detection requirements in the semiconductor and microelectronics fields, such as nanoscale film thickness measurement, it is fully capable.

Is the F20 film thickness gauge complex to install? Does it require professional personnel?

Installation is very simple. Simply connect this non-contact film thickness measurement device via USB to a computer running Windows, connect the sample stage, and setup is complete within minutes. The accompanying FILMeasure software has an intuitive interface that requires no professional training to operate, making film thickness detection fast and easy.

Related Product Recommendations

F40 Microscopic Film Thickness Gauge

Small spot size, ideal for micro-area measurement

View Details →

F50 Automatic Mapping Film Thickness Gauge

Fully automatic multi-point measurement, ideal for production lines

View Details →

Free Sample Testing Service

Free Sample Testing Service

Not sure if your sample is suitable for our measurement equipment? We offer free sample testing services! Simply send us your samples, and our professional engineers will test them using advanced measurement equipment and provide you with a detailed test report and solution recommendations.

Book Free Testing

Contact us to get a sample measurement solution!

PRECISION THIN FILM MEASUREMENT EXPERT

平台: