Filmetrics F54 High Resolution Automatic Thin Film Measurement System | Fully Automatic Mapping Film Thickness Gauge

Filmetrics F54 Automatic Thin Film Measurement System

Name: Filmetrics F54 High Resolution Automatic Thin Film Measurement System
Brand: Filmetrics
Availability: InStock

Fully automatic Mapping film thickness gauge | One-click film thickness surface morphology analysis | Programmable automatic sample stage

Filmetrics F54 High Resolution Automatic Thin Film Measurement System

4nm~120μm

Thickness measurement range

2μm

Minimum beam size

0.02nm

Measurement accuracy

450mm

Maximum sample diameter

2 pts/sec

Scanning speed

Product Introduction

Filmetrics F54 is a high-resolution automatic thin film measurement system that uses spectral reflectance (white light interferometry technology) to measure the thickness, refractive index, reflectivity, and surface roughness of thin films in a non-contact manner. Five configurations cover a film thickness measurement range of 4nm to 120μm, with a wavelength range of 190-1700nm, a minimum spot size down to 2μm, and a measurement accuracy of 0.02nm.

Equipped with a motorized R-Theta (polar coordinate) or XY automatic stage, it automatically moves and positions according to preset patterns, measuring up to 2 points per second, and supports large-sized samples up to 450mm in diameter. Built-in dozens of polar coordinate, rectangular, and linear mapping modes, users can customize measurement points, with real-time display of 2D/3D film thickness distribution maps. Built-in 500+ material library and advanced modeling algorithms, covering full-scenario requirements from nanoscale ultra-thin films to hundred-micron thick films.

Industry Benchmark

Filmetrics F54 is widely used in semiconductor wafer manufacturing, compound semiconductors, LCD/OLED displays, optical coatings, MEMS, solar cells, and other fields — an ideal tool for analyzing thin film thickness uniformity.

Core Advantages

Fully automatic Mapping

Motorized R-Theta or XY stage, automatically positioned according to preset patterns, with a maximum speed of 2 points per second, supporting 450mm large-sized samples.

Flexible scanning modes

Built-in dozens of concentric circle, rectangular, and linear modes, allowing users to customize an unlimited number of measurement points and complete recipe creation in minutes.

2D/3D visualization

Real-time generation of film thickness distribution maps, multiple perspectives for viewing uniformity, supporting data export and comparative analysis.

Wide range and high precision

Thickness range 4nm~120μm with 0.02nm accuracy. Five configurations meet full-scenario requirements from ultra-thin to thick films.

Rich material library

Built-in 500+ material library, supporting advanced modeling and custom dispersion, accurately fitting multi-layer film structures.

Typical Application Areas

Semiconductor wafer

Photoresist

Dielectric layer/Oxide

Compound semiconductor

OLED display

ITO/TCO conductive film

LCD liquid crystal gap

MEMS

Optical coating/AR film

Solar cell

Parylene coating

Biomedical coatings

PVD/CVD thin film

Waterproof coating

Anodized film

Measurement Principle

Spectral reflectance method: When the sample is illuminated with white light, the reflected light at the upper and lower interfaces of the film interferes, forming a characteristic spectrum. By analyzing the oscillation frequency of the spectrum, the thickness of the film layer can be accurately calculated (the denser the oscillation, the greater the thickness), while obtaining optical constants such as refractive index (n), extinction coefficient (k), and reflectivity. The F54 is equipped with a high-precision spectrometer and an automatic stage to achieve fully automatic multi-point mapping measurement and quickly generate thickness uniformity distribution maps.

Product Parameters

Model	F54 (five configurations available)	Brand	Filmetrics (KLA)
Measurement Technology	Spectral reflectance method	Measurement Method	Non-contact / automatic mapping
Wavelength Range	190nm – 1700nm	Light Source	Tungsten halogen lamp / deuterium lamp
Thickness Range	4nm - 120μm (configuration dependent)	Minimum Spot Size	2μm (high-power objective)
Measurement Accuracy	0.02nm	Accuracy	1nm or 0.2%, whichever is greater
Stability	0.05nm	Stage Type	R-Theta (polar) / XY automatic stage
Maximum Sample Size	450mm diameter	Scanning Speed	Up to 2 points per second
Mapping Modes	Concentric circles, rectangular, linear, custom point array
Software Features	FILMeasure, 2D/3D film thickness distribution map, 130+ material library, multi-layer modeling, data export
For more custom configurations, please contact Unicorn Technology

Measurement Data Display

F54 Mapping measurement display

Typical 2D/3D film thickness distribution map, visually presenting the surface uniformity of the sample

Customer Reviews

The fully automatic mapping function of the F54 greatly improves the detection efficiency of photoresist thickness uniformity in our wafer fab. Programmable measurement points and 2D distribution maps make process adjustments very intuitive.

—— Process Integration Department, Semiconductor Wafer Manufacturing Plant

ITO and organic layer thickness mapping for OLED panels is fast and accurate. Supporting 450mm samples fully meets the needs of our large-sized production line.

—— Array Engineering Department, Display Panel Manufacturer

Frequently Asked Questions (FAQ)

What size samples can the F54 measure?+

The F54 supports samples up to 450mm in diameter and can be configured with R-Theta (polar coordinate) or XY automatic stages to meet the measurement needs of 12-inch wafers and large-area panels.

What is the scanning speed? Can measurement points be customized?+

The maximum measurement speed is 2 points per second. Supports dozens of built-in mapping modes (concentric circles, rectangular, linear), and users can also customize an unlimited number of measurement points to create recipes in minutes.

Can multi-layer film structures be measured?+

Yes. The F54 features advanced modeling algorithms and a 130+ material library, supporting thickness and refractive index analysis of multi-layer film structures, and can simultaneously output parameters for each layer.

What is the minimum detectable spot size?+

Paired with a high-power objective lens, the minimum spot size can reach 2μm, suitable for thin film thickness measurement of small areas or patterned samples.

What is the difference between the F54 and F20/F10 series?+

The F54 is a model designed specifically for fully automatic Mapping, equipped with an automatic stage and mapping software, suitable for large-area uniformity analysis. The F20/F10 series is designed for single-point measurement or rapid sampling on production lines, with different positioning.

Free Sample Testing Service

Not sure if your film samples are suitable for the F54 for fully automatic mapping measurement? We offer free sample testing services! Send us your samples, and our professional engineers will use the F54 to conduct film thickness uniformity analysis and provide detailed measurement reports.

Tags: KLA Filmetrics