Filmetrics F54-XY-200 Automatic Film Thickness Mapping Instrument | 200mm Fully Automatic Mapping System

Filmetrics F54-XY-200 Automatic Film Thickness Mapping Instrument

Fully automatic XY sample stage | 200mm wafer mapping | Spectral reflection technology | Fastest 2 points/second

4nm~120μm

Thickness range (config dependent)

0.02nm

Measurement accuracy

200×200mm

XY stage travel

2 pts/sec

Scanning speed

2~100μm

Spot size (config dependent)

Product Introduction

Filmetrics F54-XY-200 Automatic Film Thickness Mapping Instrument is an advanced spectral reflectance system designed specifically for analyzing the thickness distribution of thin films. Using a motorized XY stage, it can automatically measure film thickness, refractive index, reflectivity, absorptivity, and surface roughness on samples up to 200mm × 200mm. The system is equipped with advanced spectral reflectance technology and industry-leading Filmetrics algorithms, supporting both patterned and unpatterned samples, and can complete data acquisition of up to 2 measurement points per second. The F54-XY-200 offers five wavelength configurations, covering a thickness measurement range from 4nm to 120μm, with selectable spot sizes from 2μm to 100μm. It is suitable for film thickness uniformity detection and process monitoring in fields such as semiconductor wafers, optical coatings, flat panel displays, MEMS, and more.

KLA Instruments

Based on industry-leading thin film metrology technology, supporting patterned and unpatterned samples, automatic focusing and pattern recognition, real-time imaging, and integrated reflectance and thickness reference films.

Core Advantages

Fully automatic XY stage

The motorized XY stage automatically moves to preset measurement points, supporting rectangular, linear, polar coordinate, and custom measurement patterns with no limit on the number of measurement points.

High-speed mapping capability

Maximum measurement speed of 2 points per second, enabling complete thickness distribution maps for large-area samples in a short period of time.

Broad range and high precision

Five configurations cover a thickness range from 4nm to 120μm with 0.02nm accuracy, providing comprehensive coverage from ultra-thin to thick films.

Patterned sample support

Integrated autofocus and pattern recognition functions enable precise measurement of designated micro-areas on patterned wafers or devices.

Real-time imaging and tracking

Built-in integrated camera provides real-time imaging, and the advanced history recording function can save, reproduce, and export measurement results.

Rich material library

Comprehensive material library and advanced modeling algorithms, supporting multi-layer film fitting and n/k value extraction.

Applicable Film Types

Oxide/Nitride

Photoresist/Polymer

ITO/TCO electrodes

Optical coatings (TiO₂/SiO₂)

Amorphous/Poly-Si

Semiconductor films

OLED organic layers

Hard/AR coatings

Biomedical coatings

Multi-layer stacks

*Suitable for transparent, semi-transparent, and low absorption coefficient films, supporting both patterned and unpatterned samples.

Measurement Principle

The F54-XY-200 uses spectral reflectance (white light interferometry) technology. White light is vertically directed onto the film surface, and the reflected light from the upper and lower interfaces of the film creates a characteristic interference spectrum. By analyzing the oscillation frequency and amplitude of the spectrum, film thickness can be accurately calculated—denser oscillations indicate thicker films—while also deriving optical constants such as refractive index (n) and extinction coefficient (k). Combined with the motorized XY stage and autofocus function, the system can rapidly perform multi-point measurements on wafers or panels, and construct a complete 2D/3D film thickness distribution map.

Typical Industrial Applications

Industry	Typical Applications and Film Layers
Semiconductor Manufacturing	Wafer oxide/nitride thickness measurement, photoresist uniformity analysis, amorphous/poly-Si film thickness
Compound Semiconductors	Thickness and uniformity detection of GaAs, SiC and other compound semiconductor films
Flat Panel Displays	ITO/TCO sheet resistance correlation, LC cell gap, polyimide, OLED organic layer mapping
Optical Coatings	AR/HR multi-layer film thickness control, hard coating, filter coating uniformity
MEMS	Microstructure thin film thickness characterization and critical layer monitoring
Biomedical	Coating thickness measurement for catheters/stents/implants, non-contact NDT

Product Parameters

Product Model	F54-XY-200	Brand	Filmetrics (KLA)
Measurement Technology	Spectral Reflectance (non-contact)	Stage Type	Motorized XY stage
Stage Travel	200mm × 200mm	Max Sample Size	200mm diameter
Thickness Range	4nm~120μm (config dependent)	Measurement Accuracy	0.02nm
Accuracy	1nm or 0.2%, whichever is greater	Stability	0.05nm
Spot Size	2μm~100μm (config dependent)	Wavelength Range	190nm~1700nm (config dependent)
Scanning Speed	Up to 2 points per second	Measurement Functions	Thickness, refractive index, reflectivity, absorptivity, surface roughness
Software Features	Automated mapping modes (rectangular/linear/polar/custom), 2D/3D distribution maps, SPC, multi-layer modeling, history recording
Standard Accessories	Integrated spectrometer/light source module, microscope adapter, reflectance standard, thickness standard
For more parameters and custom configurations, please contact Unicorn Technology

F54-XY Series Selection Guide

Model	Thickness Range	Wavelength Range	Typical Application Scenarios
F54-XY-UV	4nm ~ 35μm	190 ~ 1100nm	Automated mapping of ultra-thin films (photoresist, OLED)
F54-XY-UVX	4nm ~ 115μm	190 ~ 1700nm	Wide spectrum multi-layer and complex stacked structure analysis
F54-XY	20nm ~ 50μm	380 ~ 1050nm	General semiconductor and polymer film thickness distribution
F54-XY-NIR	100nm ~ 120μm	950 ~ 1700nm	Thick film mapping on silicon substrates, TCO/ITO layers

Not sure which model to choose? Contact an engineer for recommendations →

Measurement Data Display

Typical results: Wafer surface film thickness distribution map andpattern recognition

Customer Reviews

The F54-XY-200's automatic mapping function has greatly improved the efficiency of our wafer thickness uniformity detection by several times. After setting up the measurement program, the system automatically completes all point measurements and generates distribution maps with excellent repeatability and accuracy.

—— Semiconductor Wafer Foundry, Quality Engineer

We use the F54-XY-200 to monitor coating uniformity on large-area ITO glass. The 2D/3D thickness maps generated by the software are very intuitive, helping us quickly identify process deviations and optimize sputtering parameters, resulting in significant yield improvement.

—— Touch Panel Manufacturer, Process Development Department

Frequently Asked Questions (FAQ)

What are the main differences between F54-XY-200 and F54 (R-Theta stage)?+

The F54-XY-200 uses a motorized XY stage with 200mm × 200mm travel, suitable for automated mapping of square samples or non-circular substrates. The standard F54 uses a motorized R-Theta (polar coordinate) stage specifically designed for circular wafers up to 450mm in diameter. The core measurement technology is the same; the difference lies in the stage type and applicable sample shape.

What is the maximum sample size that can be measured?+

The standard configuration of the F54-XY-200 has a stage travel of 200mm × 200mm, accommodating 8-inch wafers or square panels of corresponding size. If you need to measure 300mm wafers, you can choose the F54-XY-300 or F54-XYT-300 (with rotation stage).

Can it measure patterned samples?+

Yes. The F54-XY-200 supports measurement of both patterned and unpatterned samples. The system is equipped with autofocus and pattern recognition functions for precise positioning of preset micro-area measurement points.

What is the thickness measurement range?+

It depends on the specific configuration. The F54-XY series offers five wavelength configurations with thickness ranges from 4nm to 120μm. The UV configuration is suitable for ultra-thin films (from 4nm), while the NIR configuration is suitable for thicker film layers (up to 120μm). For specific selection, please consult our engineer.

What mapping modes does the software support?+

The FILMeasure software supports multiple preset mapping modes including rectangular, linear, and polar coordinate patterns, as well as user-defined measurement points with no limit on the number of points. Measurement results can generate 2D/3D thickness distribution maps and support SPC statistical analysis.

Free Sample Testing Service

Not sure if the F54-XY-200 is suitable for your film thickness analysis needs? We offer free sample testing services! Send us your samples, and our professional engineers will conduct fully automatic thickness measurement and analysis, providing you with detailed thickness distribution reports and selection recommendations.