Filmetrics' precise spectral measurement system enables users to simply and quickly measure the thickness and optical constants of films. By analyzing the reflection spectra between the upper and lower interfaces of the film layer to be measured, the results can be obtained within seconds.
Filmetrics F40 Film thickness measuring instrumenttheSpectral measurement systemEnable users to measure the thickness and optical constants of films simply and quickly. By analyzing the reflection spectra between the upper and lower interfaces of the film layer to be tested, the measurement results can be obtained within a few seconds. When the measurement needs to be carried out in certain tiny and limited areas on the surface of the sample to be tested, or when other applications require a spot as small as1It can be used at micrometersFilmetrics F40 Film thickness measuring instrument. By first calibrating the objective lens of the microscope and then conducting the measurement, the thickness and optical parameter values can be obtained. Just throughFilmetricstheC-mountConnect the attachment,Filmetrics F40 A film thickness gauge will doIt can be used in conjunction with most microscopes on the market.C-mountIt is equipped withCCDCameraIt enables users to clearly view the samples and measurement positions on the computer screen.
The film thickness measurement system combined with the microscope has a measurement accuracy with a light spot as small as one micron.
It is compatible with most microscopes on the market for connection and use.
Observe the sample clearly and intuitively and confirm the measurement position;
When incident light passes through the interfaces of different substances, some of the light will be reflected. Due to the wave nature of light, the reflected light from multiple interfaces interferes with each other, causing the multi-wavelength spectrum of the reflected light to oscillate. From the oscillation frequency of the spectrum, the distance between different interfaces can be determined, and thus the thickness of the material can be obtained (the more oscillations, the greater the thickness). At the same time, other material properties such as refractive index and roughness can also be obtained.
Film characteristics: thickness, reflectance, transmittance, optical constant, uniformity, etching amount, etc
Film types: Transparent and semi-transparent films, commonly such as oxides, polymers and even air
The state of the film: Solid, liquid and gaseous films can all be measured
Thin film structure: single-layer film, multi-layer film; Plane, curved surface
Biomedical components | MEMS Micro-electromechanical systems | LCD liquid crystal display | |
Photoresist | Polymer | Photoresist | Box thickness |
Oxide/Nitride | Poly (p-xylene) | Silicon film | Polyimide |
silicon | Biofilm/Thickness of the bubble wall | Aluminum nitride | ITOConductive transparent film |
Semiconductor film layer | Implant the drug coating | Zinc oxide film filter |
Wavelength range | 190nm-1690nm | Light source | Internal microscope light source |
MeasurementnkMinimum thickness value | 50nm | Measurement accuracy | 0.02 nm |
Stability | 0.05 nm | Accuracy*Take the larger one | 50nm |
For more parameters, please contact us | |||
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